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Control-oriented modeling and feedback control of reactive sputtering

presented by the running example of depositing aluminum oxide by means of an rf magnetron ccp set-up - 4 - 17875390

Buch von Christian Wölfel

93869399

nur 59,95 €

(portofrei!, inkl. MwSt.)

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  • Details
  • Beschreibung
  • Information zum Autor
Details
Artikel-Nr.:
93869399
Im Sortiment seit:
01.05.2021
Erscheinungsdatum:
03.03.2021
Medium:
Buch
Einband:
Gebunden
Autor:
Wölfel, Christian
Verlag:
Books on Demand
BoD - Books on Demand
Sprache:
Englisch
Rubrik:
Maschinenbau
Fertigungstechnik
Seiten:
288
Informationen:
HC runder Rücken kaschiert
Gewicht:
1730 gr
Beschreibung
This thesis investigates the nonlinear reactive sputter process in a novel way: both from the control-theoretical side and from the plasma-physical side.
The plasma behavior is explicitly considered for the process modeling and for the design of the control system to establish steady-state plasma conditions. By use of one of the presented control systems an unstable operation point of the process can be stabilized, which enables high deposition speed and a stoichiometric thin film subject to steady-state plasma conditions. In this framework, the plasma state is either defined by the self-bias voltage or the electron density. The application of the Multipole Resonance Probe allows to control the electron density as a quantity that directly characterizes the plasma state.
Experimental results validate the applicability of the developed models and of the developed control systems for various process conditions. Algorithms summarize the steps for the model identification as well as for the control system design. In addition, the technical components of the experimental set-up and dominant process drifts that occur are described in detail.
Information zum Autor
Christian Woelfel is postdoctoral researcher at Ruhr University Bochum, Germany. In his work, he combines the fields of control engineering and plasma science to develop an advanced plasma-oriented control strategy for vacuum processes. His research interests are focused on the modeling and control of physical systems against the background of interdisciplinary research themes that include plasma-based processes, process instrumentation and control theory.